https://scholars.lib.ntu.edu.tw/handle/123456789/307543
Title: | Quality improvement of ultrathin gate oxide by using thermal growth followed by SF ANO technique | Authors: | JENN-GWO HWU | Issue Date: | 2004 | Journal Volume: | 25 | Journal Issue: | 10 | Start page/Pages: | 687-689 | Source: | IEEE Electron Device Letters | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-5044240747&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/307543 |
DOI: | 10.1109/LED.2004.836031 |
Appears in Collections: | 電機工程學系 |
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