https://scholars.lib.ntu.edu.tw/handle/123456789/338633
Title: | Effect of oxidation pressure on the characteristics of fluorinated thin gate oxides prepared by room temperature deposition followed by rapid thermal oxidation | Authors: | Yeh, Kuo-Lang Jeng, Ming-Jer Hwu, Jenn-Gwo JENN-GWO HWU |
Issue Date: | 1998 | Journal Volume: | 22 | Journal Issue: | 4 | Start page/Pages: | 539-545 | Source: | Proceedings of the National Science Council, Republic of China, Part A: Physical Science and Engineering | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0032115466&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/338633 |
Appears in Collections: | 電機工程學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.