https://scholars.lib.ntu.edu.tw/handle/123456789/350116
Title: | Use of SiO<inf>2</inf> nanoparticles as etch mask to generate large-area GaAs nanowires by Induced-Coupled Plasma Reactive Ion Etcher | Authors: | Wang, D.-S. Chao, J.-J. CHING-FUH LIN |
Issue Date: | 2009 | Source: | Optics InfoBase Conference Papers | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-84897957968&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/350116 |
Appears in Collections: | 電機工程學系 |
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