https://scholars.lib.ntu.edu.tw/handle/123456789/366467
Title: | Impact of process-effect correction strategies on variability of critical dimension and electrical characteristics in extreme ultraviolet lithography | Authors: | Ng, Philip C.W. Chien, Sheng-Wei Chang, Bo-Sen Tsai, Kuen-Yu Lu, Yi-Chang Li, Jia-Han Chen, Alek C. YI-CHANG LU KUEN-YU TSAI |
Issue Date: | Jun-2011 | Journal Volume: | 50 | Journal Issue: | 6 | Start page/Pages: | 06GB07 | Source: | Japanese Journal of Applied Physics | URI: | http://scholars.lib.ntu.edu.tw/handle/123456789/366467 | DOI: | 10.1143/JJAP.50.06GB07 |
Appears in Collections: | 電機工程學系 |
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