https://scholars.lib.ntu.edu.tw/handle/123456789/374085
Title: | Study of etching bias modeling and correction strategies for patterning processes | Authors: | Philip C.W. Ng Kuen-Yu Tsai Lawrence S. Melvin III KUEN-YU TSAI |
Issue Date: | Sep-2012 | Start page/Pages: | P071-559 | Source: | 38th International Micro & Nano Engineering Conference (MNE 2012) | URI: | http://scholars.lib.ntu.edu.tw/handle/123456789/374085 |
Appears in Collections: | 電機工程學系 |
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