https://scholars.lib.ntu.edu.tw/handle/123456789/429894
Title: | Characterization of proximity effects in helium ion beam lithography by direct Monte Carlo simulation and resist calibration | Authors: | Chien-Lin Lee Sheng-Wei Chien Kuen-Yu Tsai* KUEN-YU TSAI |
Issue Date: | 2018 | Source: | The 31th International Microprocesses and Nanotechnology Conference (MNC 2018) | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/429894 |
Appears in Collections: | 電機工程學系 |
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