https://scholars.lib.ntu.edu.tw/handle/123456789/432421
Title: | Investigation of defects in ultra-thin Al 2 O 3 films deposited on pure copper by the atomic layer deposition technique | Authors: | Chang M.L. Wang L.C. Lin H.C. Chen M.J. Lin K.M. |
Issue Date: | 2015 | Publisher: | Elsevier B.V. | Journal Volume: | 359 | Start page/Pages: | 533-542 | Source: | Applied Surface Science | URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84961782222&doi=10.1016%2fj.apsusc.2015.10.144&partnerID=40&md5=80df6b9520e44fa5fa423f7d99eef473 https://scholars.lib.ntu.edu.tw/handle/123456789/432421 |
ISSN: | 01694332 | DOI: | 10.1016/j.apsusc.2015.10.144 |
Appears in Collections: | 材料科學與工程學系 |
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