https://scholars.lib.ntu.edu.tw/handle/123456789/443418
Title: | Achieving 1 nm capacitive effective thickness in atomic layer deposited HfO<inf>2</inf> on In<inf>0.53</inf>Ga<inf>0.47</inf>As | Authors: | Lee, K.Y. Lee, Y.J. Chang, P. Huang, M.L. Chang, Y.C. MINGHWEI HONG Kwo, J. |
Issue Date: | 2008 | Journal Volume: | 92 | Journal Issue: | 25 | Source: | Applied Physics Letters | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/443418 | DOI: | 10.1063/1.2952826 |
Appears in Collections: | 物理學系 |
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