https://scholars.lib.ntu.edu.tw/handle/123456789/492142
Title: | Accelerating the oxidation rate of AlN substrate through the addition of water vapor | Authors: | Yeh, C.-T. Tuan, W.-H. WEI-HSING TUAN |
Issue Date: | 2017 | Journal Volume: | 5 | Journal Issue: | 4 | Start page/Pages: | 381-384 | Source: | Journal of Asian Ceramic Societies | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/492142 | DOI: | 10.1016/j.jascer.2017.08.001 |
Appears in Collections: | 材料科學與工程學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.