公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2002 | Diluted low dielectric constant materials as bottom antireflective coating layers for both KrF and ArF lithography | Chen, H.L.; Chao, W.C.; Ko, F.H.; Chu, T.C.; Cheng, H.C.; HSUEN-LI CHEN | 2002 International Microprocesses and Nanotechnology Conference, MNC 2002 | | | |
2003 | Enhance Extreme UltraViolet Lithography mask inspection contrast by using Fabry-Perot type antireflective coatings | Cheng, H.C.; Chen, H.L.; Ko, T.S.; Lai, L.J.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | | | |
2004 | Fabrication of autocloned photonic crystals by using high-density-plasma chemical vapor deposition | Chen, H.L.; Lee, H.F.; Chao, W.C.; Hsieh, C.I.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | | | |
2001 | A Fabry-Perot type anti-reflective coating for deep ultraviolet binary photomask application | Chen, H.L.; Hsu, C.K.; Chen, B.C.; Ko, F.H.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | | | |
2003 | Fabry-Perot type antireflective coatings for binary mask applications in ArF and F <inf>2</inf> excimer laser lithographies | Chen, H.L.; Lee, C.C.; Chuang, Y.F.; Liu, M.C.; Hsieh, C.I.; Ko, F.H.; HSUEN-LI CHEN | Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest | | | |
2003 | Fabry-Perot type antireflective coatings for binary mask applications in ArF and F<inf>2</inf>excimer laser lithographies | Chen, H.L.; Lee, C.C.; Chuang, Y.F.; Liu, M.C.; Hsieh, C.I.; Ko, F.H.; HSUEN-LI CHEN | Electrochemical and Solid-State Letters | | | |
2004 | High reflectance of reflective-type attenuated-phase-shifting masks for extreme ultraviolet lithography with high inspection contrast in deep ultraviolet regimes | Chen, H.L.; Cheng, H.C.; Ko, T.S.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | | | |
2002 | Low alkaline contamination bilayer bottom antireflective coatings in F<inf>2</inf> excimer laser lithography | Chen, H.L.; Chuang, Y.F.; Lee, C.C.; Ko, F.H.; Hsieh, C.I.; Huang, T.Y.; HSUEN-LI CHEN | Electrochemical and Solid-State Letters | | | |
2003 | Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications | Chen, H.L.; Chuang, Y.F.; Lee, C.C.; Hsieh, C.I.; Ko, F.H.; LON A. WANG ; HSUEN-LI CHEN | Microelectronic Engineering | 0 | 0 | |
2001 | Low dielectric constant FLARE 2.0 films as bottom antireflective coating layers for ArF lithography | Chen, H.L.; Cheng, H.C.; Li, M.Y.; Ko, F.H.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | | | |
2001 | Low dielectric constant SILK films as bottom antireflective coating layers for both KrF and ArF lithography | Chen, H.L.; Ko, F.H.; Chu, T.C.; Cheng, H.C.; Huang, T.Y.; HSUEN-LI CHEN | 2001 International Microprocesses and Nanotechnology Conference, MNC 2001 | | | |
2001 | Low-dielectric constant bisbenzo(cyclobutene) and fluorinated poly(arylene)ether films as bottom anti-reflective coating layers for ArF lithography | Chen, H.L.; Chu, T.C.; Li, M.Y.; Ko, F.H.; Cheng, H.C.; Huang, T.Y.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | | | |
2002 | Low-dielectric constant FLARE 2.0 films for bottom antireflective coating layers in KrF lithography | Chen, H.L.; Cheng, H.C.; Li, M.Y.; Ko, F.H.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Solid-State Electronics | | | |
2002 | Multilayer bottom antireflective coatings for high numerical aperture and modified illumination exposure systems | Chen, H.L.; Fan, W.; Wang, T.J.; Ko, F.H.; Hsieh, C.I.; HSUEN-LI CHEN | 2002 International Microprocesses and Nanotechnology Conference, MNC 2002 | | | |
2002 | Novel bilayer bottom antireflective coating structure for high-performance ArF lithography applications | Chen, H.L.; Chao, W.C.; Ko, F.H.; Chu, T.C.; Huang, T.Y.; HSUEN-LI CHEN | Journal of Microlithography, Microfabrication and Microsystems | | | |
2004 | Optical properties of two-dimensional photonic-bandgap crystals characterized by spectral ellipsometry | Hsieh, C.I.; Chen, H.L.; Chao, W.C.; Ko, F.H.; HSUEN-LI CHEN | Microelectronic Engineering | | | |
2003 | Optical-gradient type of antireflective coatings for sub-70 nm optical lithography applications | Chen, H.L.; Fan, W.; Wang, T.J.; Ko, F.H.; Zhai, R.S.; Hsu, C.K.; Chuang, T.J.; HSUEN-LI CHEN | Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest | | | |
2003 | Patterning of self-assembled nanoparticles by electron-beam lithography with chemically amplified resists | Kuo, C.I.; Chen, H.L.; Chu, Y.H.; Liu, F.K.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | | | |
2003 | Porous materials with ultra-low dielectric constant as antireflective coating layers for F 2 and ArF lithography | Chen, H.L.; Tu, C.W.; Wang, T.J.; Liu, P.T.; Ko, F.H.; Chung, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | | | |
2005 | Rapidly selective growth of nanoparticles by electron-beam and optical lithographies with chemically amplified resists | Chen, H.L.; Chu, Y.H.; Kuo, C.I.; Liu, F.K.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Electrochemical and Solid-State Letters | | | |