| Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
| 2010 | 10 nm lines with 14 nm half pitch grating written in HSQ by electron beam direct write at 5 keV | Fu-Min Wang; Susumu Ono; Hsin-Hung Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI | The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication | | | |
| 2006 | A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography | Ni Hu; Arthur Tay; Kuen-Yu Tsai; KUEN-YU TSAI | Measurement Science and Technology | 5 | 2 |  |
| 2009 | A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows | Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; KUEN-YU TSAI ; JIA-HAN LI | Lithography Asia 2009 - Proc. SPIE | 3 | 0 | |
| 2014 | A New EUV Mask Blank Defect Inspection Method with Coherent Diffraction Imaging | Ding Qi; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI | 2014 International Workshop on EUV Lithography | | | |
| 2008 | A new method to improve accuracy of leakage current estimation for transistors with non-rectangular gates due to sub-wavelength lithography effects | Kuen-Yu Tsai; Meng-Fu You; Yi-Chang Lu; Philip C. W. Ng; YI-CHANG LU ; KUEN-YU TSAI | ICCAD 2008, IEEE/ACM International Conference on Computer-Aided Design | 9 | 0 | |
| 2010 | A new method to improve accuracy of parasitics extraction considering sub-wavelength lithography effects | Kuen-Yu Tsai; Wei-Jhih Hsieh; Yuan-Ching Lu; Bo-Sen Chang; Sheng-Wei Chien; Yi-Chang Lu; YI-CHANG LU ; KUEN-YU TSAI | ASP-DAC 2010, The 15th Asia and South Pacific Design Automation Conference | 1 | 0 | |
| 2009 | A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography | Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI | The 53th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication 2009 | | | |
| 2010 | A non-delta-chrome OPC methodology for nonlinear process models | Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI | The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication | | | |
| 2010 | A non-delta-chrome OPC methodology for process models with three-dimensional mask effects | Philip C. W. Ng; Kuen-Yu Tsai; Chih-Hsien Tang; Lawrence S. Melvin III; KUEN-YU TSAI | Advanced Lithography 2010 | 1 | 0 | |
| 2008 | A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography | Chun-Hung Liu; Hoi-Tou Ng; Philip C. W. Ng; Kuen-Yu Tsai; Shy-Jay Lin; Jeng-Horng Chen; KUEN-YU TSAI | Lithography Asia 2008 - Proc. SPIE | 5 | 0 | |
| 2009 | A simple design rule check for DP decomposition | Chih-Hsien Tang; Kuen-Yu Tsai; KUEN-YU TSAI | Design Automation Conference 2009 | | | |
| 2010 | Analysis of fabrication misalignment effects in a MEMS-based electron-optical system design for direct-write lithography | Sheng-Yung Chen; Chieh-Chien Huang; Shin-Chuan Chen; Ting-Han Pei; Kuen-Yu Tsai; KUEN-YU TSAI | The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication | | | |
| 0 | Apparatus and Method for Estimating Change of Status of Particle Beams | Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI | | | | |
| 2014 | Apparatus and Method for Estimating Change of Status of Particle Beams (粒子束狀態改變之估測裝置及其方法) | Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI | | | | |
| 2012 | Architecture and EOS Design Flow of a Multiple-Electron-Beam–Direct-Write System Considering Patterning Fidelity, Breakdown Effect | Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; KUEN-YU TSAI | 38th International Micro & Nano Engineering Conference (MNE 2012) | | | |
| 2010 | Beam drift detection using a two-dimensional electron beam position monitor system for multiple-electron-beam–direct-write lithography | Sheng-Yung Chen; Kuen-Yu Tsai; Hoi-Tou Ng; Chi-Hsiung Fan; Ting-Han Pei; Chieh-Hsiung Kuan; Yung-Yaw Chen; Yi-Hung Kuo; Cheng-Ju Wu; Jia-Yush Yen; KUEN-YU TSAI | The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication | | | |
| 0 | Charged-Particle-Beam Patterning Without Resist | Kuen-Yu Tsai; Miin-Jang Chen; Samuel C. Pan; KUEN-YU TSAI | | | | |
| 2002 | Design of Feedforward and Feedback Controllers by Signal Processing and Convex Optimization Techniques | Kuen-Yu Tsai; KUEN-YU TSAI | | | | |
| 2004 | Design of feedforward filters for improving tracking performances of existing feedback control systems | Kuen-Yu Tsai; Charles D. Schaper; Thomas Kailath; KUEN-YU TSAI | IEEE Transactions on Control Systems Technology | 9 | 5 | |
| 2009 | Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability | Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI | Lithography Asia 2009 | | | |
