公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2011 | A miniaturized 3 dB branch-Line hybrid coupler with harmonics suppression | Tsai, K.-Y.; Yang, H.-S.; Chen, J.-H.; Chen, Y.-J.E.; YI-JAN EMERY CHEN ; Chen, Jau-Horng | IEEE Microwave and Wireless Components Letters | 145 | 112 | |
2010 | A miniaturized branch-line coupler using finger-shape distributed capacitors | Tsai, K.-Y.; Yang, H.-S.; Chen, J.-H.; Chen, Y.-J.E.; YI-JAN EMERY CHEN | Asia-Pacific Microwave Conference, APMC | | | |
2010 | Architecture for next generation massively parallel maskless lithography system (MPML2) | Su, M.-S.; Tsai, K.-Y.; Lu, Y.-C.; Kuo, Y.-H.; Pei, T.-H.; Yen, J.-Y.; YI-CHANG LU ; KUEN-YU TSAI ; JIA-YUSH YEN | Proceedings of SPIE - The International Society for Optical Engineering | | | |
2008 | Design of automatic controllers for model-based OPC with optimal resist threshold determination for improving correction convergence | Su, Y.-S.; Ng, P.C.W.; Tsai, K.-Y.; YUNG-YAW CHEN ; KUEN-YU TSAI | Proceedings of SPIE - The International Society for Optical Engineering | 15 | 0 | |
2012 | Direct-scatterometry-enabled lithography model calibration | Chen, C.-Y.; Tsai, K.-Y.; Shen, Y.-T.; Lee, Y.-M.; Li, J.-H.; Shieh, J.J.; KUEN-YU TSAI ; JIA-HAN LI | Proceedings of SPIE - The International Society for Optical Engineering | 3 | 0 | |
2013 | Direct-scatterometry-enabled optical-proximity-correction-model calibration | Chen, C.-Y.; Ng, P.C.W.; Liu, C.-H.; Shen, Y.-T.; Tsai, K.-Y.; Li, J.-H.; Shieh, J.J.; KUEN-YU TSAI ; JIA-HAN LI | Proceedings of SPIE - The International Society for Optical Engineering | 1 | 0 | |
2014 | Direct-scatterometry-enabled PEC model calibration with two-dimensional layouts | Yang, Y.-Y.; Lee, H.-P.; Liu, C.-H.; Yu, H.-Y.; Tsai, K.-Y.; KUEN-YU TSAI ; JIA-HAN LI | Proceedings of SPIE - The International Society for Optical Engineering | 0 | 0 | |
2010 | Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method | Lee, Y.-M.; Li, J.-H.; Ng, P.C.W.; Pei, T.-H.; Wang, F.-M.; Tsai, K.-Y.; KUEN-YU TSAI ; JIA-HAN LI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 2 | 3 | |
2012 | Electron-beam proximity effect model calibration for fabricating scatterometry calibration samples | Yu-Tian Shen; Liu, C.-H.; Chen, C.-Y.; Ng, H.-T.; Tsai, K.-Y.; Wang, F.-M.; Kuan, C.-H.; Lee, Y.-M.; Cheng, H.-H.; Li, J.-H.; KUEN-YU TSAI ; CHIEH-HSIUNG KUAN ; JIA-HAN LI | Advanced Lithography - Proceeding of SPIE | 3 | 0 | |
2014 | The electrostatic potential inside the electron-optical systen with periodic boundary-value conditions | Pei, T.-H.; Tsai, K.-Y.; JIA-HAN LI ; KUEN-YU TSAI | Advanced Materials Research | 0 | 0 | |
2010 | Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors | Tsai, K.-Y.; Chen, S.-Y.; Pei, T.-H.; KUEN-YU TSAI ; JIA-HAN LI | Japanese Journal of Applied Physics | 2 | 2 | |
2019 | Frontalization with Adaptive Exponentially-Weighted Average Ensemble Rule for Deep Learning Based Facial Expression Recognition | Tsai, K.-Y.; Ding, J.-J.; Lee, Y.-C.; JIAN-JIUN DING | 2018 IEEE Asia Pacific Conference on Circuits and Systems, APCCAS 2018 | 3 | 0 | |
2011 | Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects | Ng, P.C.W.; Tsai, K.-Y.; Lee, Y.-M.; Wang, F.-M.; Li, J.-H.; KUEN-YU TSAI ; JIA-HAN LI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 27 | 24 | |
2009 | Hybrid servo design for large area nano pattern stitching | Yen, J.-Y.; Chen, C.-H.; Chen, L.-S.; Tsai, K.-Y.; Chang, S.-H.; KUEN-YU TSAI ; JIA-YUSH YEN | IEEE/ASME International Conference on Advanced Intelligent Mechatronics | | | |
2014 | Optical scatterometry system for detecting specific line edge roughness of resist gratings subjected to detector noises | Lee, Y.-M.; Li, J.-H.; Wang, F.-M.; Cheng, H.-H.; Shen, Y.-T.; Tsai, K.-Y.; Shieh, J.J.; KUEN-YU TSAI ; JIA-HAN LI | Journal of Optics (United Kingdom) | 0 | 0 | |
2019 | Precision fabrication of EUVL programmed defects with helium ion beam lithography | Lee, C.-L.; Cai, J.-S.; Chien, S.-W.; Tsai, K.-Y.; KUEN-YU TSAI | Proceedings of SPIE - The International Society for Optical Engineering | 2 | 0 | |
2009 | Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography | CHIEH-HSIUNG KUAN ; YUNG-YAW CHEN ; KUEN-YU TSAI ; JIA-YUSH YEN ; Chen, S.-Y.; Tsai, K.-Y.; Ng, H.-T.; Fan, C.-H.; Pei, T.-H.; Kuan, C.-H.; Chen, Y.-Y.; Yen, J.-Y.; CHIEH-HSIUNG KUAN ; YUNG-YAW CHEN | Proceedings of SPIE - The International Society for Optical Engineering | | | |
2014 | Refractive index and effective thickness measurement system for the RGB color filter coatings with absorption and scattering properties | Lee, Y.-M.; Cheng, H.-H.; Li, J.-H.; Tsai, K.-Y.; KUEN-YU TSAI ; JIA-HAN LI | IEEE/OSA Journal of Display Technology | 2 | 1 | |
2011 | Silicon photodiodes for electron beam position and drift detection in scanning electron microscopy and electron beam lithography system | Kuo, Y.-H.; Wu, C.-J.; Yen, J.-Y.; Chen, S.-Y.; Tsai, K.-Y.; KUEN-YU TSAI ; YUNG-YAW CHEN ; JIA-YUSH YEN | Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment | 5 | 4 | |
2014 | Simulation and experiment of speckle reduction by the beam splitting method on a pico-projection system | Pei, T.-H.; Yeh, F.-C.; Tsai, K.-Y.; Li, J.-H.; Liu, Z.-R.; Hung, C.-L.; JIA-HAN LI | Advanced Materials Research | | | |