Results 1-13 of 13 (Search time: 0.007 seconds).
Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link | |
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1 | 2016 | Provably good max-min-m-neighbor-TSP-based subfield scheduling for electron-beam photomask fabrication | Lin, Z.-W.; Fang, S.-Y.; Chang, Y.-W. ; Rao, W.-C.; CHIEH-HSIUNG KUAN ; YAO-WEN CHANG | 2015 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2015 | 1 | 0 | |
2 | 2015 | Layout decomposition for Spacer-is-Metal (SIM) self-aligned double patterning | Fang, S.-Y.; Tai, Y.-S.; Chang, Y.-W.; YAO-WEN CHANG | 20th Asia and South Pacific Design Automation Conference, ASP-DAC 2015 | 7 | 0 | |
3 | 2015 | Stitch-aware routing for multiple e-beam lithography | Liu, I.-J.; Fang, S.-Y.; Chang, Y.-W.; YAO-WEN CHANG | IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems | 6 | 6 | |
4 | 2015 | EUV and e-beam manufacturability: Challenges and solutions | Chang, Y.-W.; Liu, R.-G.; Fang, S.-Y.; YAO-WEN CHANG | Design Automation Conference | 15 | 0 | |
5 | 2014 | Overlay-Aware detailed routing for self-Aligned double patterning lithography using the cut process | Liu, I.-J.; Fang, S.-Y.; Chang, Y.-W.; YAO-WEN CHANG | Design Automation Conference | 25 | 0 | |
6 | 2014 | A novel layout decomposition algorithm for triple patterning lithography | Fang, S.-Y.; Chang, Y.-W.; Chen, W.-Y.; YAO-WEN CHANG | IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems | 46 | 43 | |
7 | 2013 | Graph-based subfield scheduling for electron-beam photomask fabrication | Fang, S.-Y.; Chen, W.-Y.; Chang, Y.-W.; YAO-WEN CHANG | IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems | 8 | 7 | |
8 | 2013 | Stitch-aware routing for multiple e-beam lithography | Fang, S.-Y.; Liu, I.-J.; Chang, Y.-W.; YAO-WEN CHANG | Design Automation Conference | 9 | 0 | |
9 | 2012 | Graph-based subfield scheduling for electron-beam photomask fabrication | Fang, S.-Y.; Chen, W.-Y.; Chang, Y.-W.; YAO-WEN CHANG | International Symposium on Physical Design | 3 | 0 | |
10 | 2012 | Native-conflict and stitch-aware wire perturbation for double patterning technology | Fang, S.-Y.; Chen, S.-Y.; Chang, Y.-W.; YAO-WEN CHANG | IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems | 20 | 16 | |
11 | 2012 | A novel layout decomposition algorithm for triple patterning lithography | Fang, S.-Y.; Chang, Y.-W.; Chen, W.-Y.; YAO-WEN CHANG | Design Automation Conference | 47 | 0 | |
12 | 2012 | Simultaneous flare level and flare variation minimization with dummification in EUVL | Fang, S.-Y.; Chang, Y.-W.; YAO-WEN CHANG | Design Automation Conference | 14 | 0 | |
13 | 2010 | Redundant-wires-aware ECO timing and mask cost optimization | Fang, S.-Y.; Chien, T.-F.; Chang, Y.-W.; YAO-WEN CHANG | IEEE/ACM International Conference on Computer-Aided Design | 15 | 0 |