https://scholars.lib.ntu.edu.tw/handle/123456789/404524
Title: | Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2, N2/H2, and NH3 plasma treatments | Authors: | M. H.Liao Li-Tien Huang Ming-Lun Chang Jhih-Jie Huang Chin-Lung Kuo Hsin-ChihLin Min-Hung Lee Miin-Jang Chen |
Issue Date: | 2012 | Start page/Pages: | 55103 | Source: | Journal of Physics D: Applied Physics | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/404524 |
Appears in Collections: | 電機工程學系 |
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