https://scholars.lib.ntu.edu.tw/handle/123456789/404526
Title: | Ferroelectric Al:HfO2 Negative Capacitance FETs | Authors: | M. H.Liao M. H. Lee P.-G. Chen S.-T. Fan Y.-C. Chou C.-Y. Kuo C.-H. Tang H.-H.Chen S.-S. Gu R.-C. Hong Z.-Y. Wang S.-Y. Chen C.-Y. Liao K.-T. Chen S.T. Chang K.-S. Li C. W. Liu |
Issue Date: | 2017 | Source: | International Electron Devices Meeting | Description: | San Francisco |
URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/404526 |
Appears in Collections: | 電機工程學系 |
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