公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2023 | eVTOL, UAM, and AAM: Brief Development History and Implementation Outlook of the United States | KUEN-YU TSAI ; Meng, Guang Yun; Wu, Tung Ling; Zheng, Ming Hui; Wang, Wei Yao; Kung, Chih Ming; Chen, Yen Chuan; Huang, Chi Fa; Hsieh, Tsang Chieh; Hsu, Hsin Sheng; Lin, Huei Der; Shi, Jing Xiang | Proceedings - 2023 IEEE International Conference on e-Business Engineering, ICEBE 2023 | | | |
2011 | Fabrication method of high-quality Ge nanocrystals on patterned Si substrates by local melting point control | Chien-Wei Chiu; Ting-Wei Liao; Kuen-Yu Tsai; Fu-Min Wang; Yuen-Wuu Suen; Chieh-Hsiung Kuan; KUEN-YU TSAI ; CHIEH-HSIUNG KUAN | Nanotechnology | 2 | 3 | |
2016 | Fabrication of metrology test structures with programmed imperfection using helium ion beam direct write | Sheng-Wei Chien; Kuen-Yu Tsai*; Jia-Han Li; KUEN-YU TSAI | 2016 ZEISS Korea Microscopy Workshop | | | |
2010 | Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write | Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2010 | 6 | 0 | |
2017 | Fabrication of programmed defects for non-imaging EUV mask inspection by helium ion beam direct milling | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | The 30th International Microprocesses and Nanotechnology Conference (MNC 2017) | | | |
2006 | Feedback control of piezo-based nanopositioning systems for semiconductor manufacturing | Chun-Hung Liu; Yea-Chin Yeh; Kuen-Yu Tsai; Jia-Yush Yen; Arthur Tay; Jyh-Fa Lee; KUEN-YU TSAI | IFAC Workshop on Advanced Process Control for Semiconductor Manufacturing | | | |
2018 | Focused helium ion beam applications in advanced-node nanolithography R/D | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | 1st Annual Zeiss Process Control Innovations Seminar (PCIS) | | | |
2010 | Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors | Tsai, K.-Y.; Chen, S.-Y.; Pei, T.-H.; KUEN-YU TSAI ; JIA-HAN LI | Japanese Journal of Applied Physics | 2 | 2 | |
2011 | Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects | Ng, P.C.W.; Tsai, K.-Y.; Lee, Y.-M.; Wang, F.-M.; Li, J.-H.; KUEN-YU TSAI ; JIA-HAN LI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 27 | 24 | |
2017 | Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness | Pulikanti Guruprasad Reddy; Neha Thakur; Chien-Lin Lee; Sheng-Wei Chien; Chullikkattil P. Pradeep; Subrata Ghosh; KUEN-YU TSAI ; Kenneth E. Gonsalves | AIP Advances | 13 | 11 | |
2009 | High resolution electron beam direct write on ZEP520 at 5 KeV | Fu-Min Wang; S. Ono; Hsing-Hong Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2009 | | | |
2010 | High spatial resolution and large field intensity by a set of two modified zone plates | Zhan-Yu Liu; Yao-Jen Tsai; Jia-Han Li; Kuen-Yu Tsai; KUEN-YU TSAI | Frontiers in Optics (FiO)/Laser Science XXVI (LS) Conference | 0 | 0 | |
2009 | Hybrid servo design for large area nano pattern stitching | Yen, J.-Y.; Chen, C.-H.; Chen, L.-S.; Tsai, K.-Y.; Chang, S.-H.; KUEN-YU TSAI ; JIA-YUSH YEN | IEEE/ASME International Conference on Advanced Intelligent Mechatronics | | | |
2006 | Identifications of the PZT Actuated Novel Optical Scanning System | Yea-Chin Yeh; Chun-Hung Liu; Kuen-Yu Tsai; Yu-Chen Kung; Jia-Yush Yen; Jyh-Fa Lee; KUEN-YU TSAI | IFAC Workshop on Advanced Process Control for Semiconductor Manufacturing | | | |
2010 | Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography | Philip C. W. Ng; Sheng-Wei Chien; Bo-Sen Chang; Kuen-Yu Tsai; Yi-Chang Lu; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2010 | | | |
2011 | Impact of process-effect correction strategies on variability of critical dimension and electrical characteristics in extreme ultraviolet lithography | Ng, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C.; YI-CHANG LU ; KUEN-YU TSAI ; Li, Jia-Han | Japanese Journal of Applied Physics | 2 | 3 | |
2007 | Impacts of optical proximity correction settings on electrical performances | Meng-Fu You; Philip C. W. Ng; Yi-Sheng Su; Kuen-Yu Tsai; Yi-Chang Lu; YI-CHANG LU ; KUEN-YU TSAI | Advanced Lithography 2007 - Proc. SPIE | 6 | 0 | |
2013 | Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography | Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Vacuum Science & Technology B | 8 | 7 | |
2010 | Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography | Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI | The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication | | | |
2023 | The Implement of a Reconfigurable Intelligence Trust Chain Platform with Anti-counterfeit Traceable Version Function for the Customized System-Module-IC | Chen, Hsing Chung; Liang, Yao Hsien; Su, Jhih Sheng; KUEN-YU TSAI ; Song, Yu Lin; Hsu, Pei Yu; Cai, Jia Syun | Lecture Notes on Data Engineering and Communications Technologies | 0 | 0 | |