Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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1998 | Ga <inf>2</inf> O <inf>3</inf> (Gd <inf>2</inf> O <inf>3</inf> ) as a dielectric insulator for GaAs device applications | Lay, T.S.; MINGHWEI HONG ; Mannaerts, J.P.; Liu, C.T.; Kwo, J.; Ren, F.; Marcus, M.A.; Ng, K.K.; Chen, Y.K.; Chou, L.J.; Hsieh, K.C.; Cheng, K.Y. | Proceedings of SPIE - The International Society for Optical Engineering | |||
2007 | InGaAs n-MOS devices integrated using ALD-HfO<inf>2</inf>/metal gate without surface cleaning and interfacial layer passivation | Chang, Y.C.; Huang, M.L.; Lee, Y.J.; Lee, K.Y.; Lin, T.D.; MINGHWEI HONG ; Kwo, J.; Liao, C.C.; Cheng, K.Y.; Lay, T.S. | 2007 International Semiconductor Device Research Symposium | |||
2000 | Initial growth of Ga <inf>2</inf> O <inf>3</inf> (Gd <inf>2</inf> O <inf>3</inf> ) on GaAs: Key to the attainment of a low interfacial density of states | MINGHWEI HONG ; Lu, Z.H.; Kwo, J.; Kortan, A.R.; Mannaerts, J.P.; Krajewski, J.J.; Hsieh, K.C.; Chou, L.J.; Cheng, K.Y. | Applied Physics Letters |