https://scholars.lib.ntu.edu.tw/handle/123456789/498862
Title: | The retardation of aluminum-amorphous silicon interaction by phosphine plasma treatment | Authors: | Wei, J.-H. SI-CHEN LEE |
Issue Date: | 1998 | Journal Volume: | 16 | Journal Issue: | 2 | Start page/Pages: | 587-589 | Source: | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/498862 | DOI: | 10.1116/1.581074 |
Appears in Collections: | 電機工程學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.