https://scholars.lib.ntu.edu.tw/handle/123456789/73442
Title: | HfO2/HfAlO/HfO2 nanolaminate charge trapping layers for high-performance nonvolatile memory device applications | Authors: | Maikap, S. Tzeng, P. J. Wang, T. Y. Lee, H. Y. Lin, C. H. Wang,? C. C. Lee, L. S. Yang, J. R. Tsai, M. J. |
Issue Date: | 2007 | Start page/Pages: | Physic-s | Source: | Japanese Journal of Applied | URI: | http://ntur.lib.ntu.edu.tw//handle/246246/93247 |
Appears in Collections: | 材料科學與工程學系 |
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