公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2005 | Fabrication of Silicon and Germanium Nanostructures by Combination of Hydrogen Plasma Dry Etching and VLS Mechanism | Yang, Ming-Che; Shieh, Jiann; Ko, Tsung-Shine; Chen, Hsuen-Li ; Chu, Tieh-Chi | Japanese Journal of Applied Physics | 2 | | |
2004 | Fabrication of sub-60-nm contact holes in silicon dioxide layers | Ko, F.-H.; You, H.-C.; Chu, T.-C.; Lei, T.-F.; Hsu, C.-C.; Chen, H.-L.; HSUEN-LI CHEN | Microelectronic Engineering | | | |
2007 | Fabrication of sub-wavelength antireflective structures in solar cells by utilizing modified illumination and defocus techniques in optical lithography | Chen, H.L.; Huang, K.T.; Lin, C.H.; Wang, W.Y.; Fan, W.; HSUEN-LI CHEN | Microelectronic Engineering | | | |
2006 | Fabrication of texturing antireflection structures in solar cells by using the defocusing exposure in optical lithography | Chen, H.L.; Fan, W.; Cheng, C.C.; Lin, C.H.; Huang, K.T.; HSUEN-LI CHEN | Journal of the Electrochemical Society | | | |
2001 | A Fabry-Perot type anti-reflective coating for deep ultraviolet binary photomask application | Chen, H.L.; Hsu, C.K.; Chen, B.C.; Ko, F.H.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | | | |
2003 | Fabry-Perot type antireflective coatings for binary mask applications in ArF and F <inf>2</inf> excimer laser lithographies | Chen, H.L.; Lee, C.C.; Chuang, Y.F.; Liu, M.C.; Hsieh, C.I.; Ko, F.H.; HSUEN-LI CHEN | Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest | | | |
2003 | Fabry-Perot type antireflective coatings for binary mask applications in ArF and F<inf>2</inf>excimer laser lithographies | Chen, H.L.; Lee, C.C.; Chuang, Y.F.; Liu, M.C.; Hsieh, C.I.; Ko, F.H.; HSUEN-LI CHEN | Electrochemical and Solid-State Letters | | | |
2002 | Fabry-Perot-type antireflective coating for deep-ultraviolet binary photomask applications | Chen, H.-L.; Chu, T.-C.; Hsu, C.-K.; Ko, F.-H.; Huang, T.-Y.; HSUEN-LI CHEN | Applied Optics | | | |
2003 | Far-Infrared Absorption of Split Ring Resonators: negative permeability at infrared region | Hsu, A. C.; Cheng, Y. K.; Chen, K. H.; Chern, J. L.; Wu, S. C.; HSUEN-LI CHEN ; Chiao, W. C.; ALISON H CHANG; Liean, C. C.; Shy, J. T. | Optics InfoBase Conference Papers | 0 | | |
2016 | Filter-free, junctionless structures for color sensing | Lin, K.-T.; Chen, H.-L.; Lai, Y.-S.; HSUEN-LI CHEN | Nanoscale | | | |
2019 | Fluorescent microdiamonds conjugated with hollow gold nanoparticles as photothermal fiducial markers in tissue | Kuo, S.-J.; Chang, S.-W.; Hui, Y.Y.; Chen, O.Y.; Chen, Y.-W.; Lin, C.-C.; Wan, D.; Chen, H.-L.; Chang, H.-C.; HSUEN-LI CHEN | Journal of Materials Chemistry C | | | |
1999 | Formation of Si nanoclusters in amorphous silicon thin films by excimer laser annealing | Yeh, Jiun-Lin; Chen, Hsuen-Li ; Shih, An; Lee, Si-Chen | Electronics Letters | 1 | 1 | |
2021 | Gallium Arsenide-Based Active Antennas for Optical Communication Photodetection with Robustness to Voltage and Temperature | Lin C.-C; Chang B.-J; Chen S.-H; Lin K.-T; Chang S.-W; Chen W.-Y; Chen B.-Y; Liu M.-C; Chen H.-L.; HSUEN-LI CHEN | Advanced Optical Materials | | | |
1999 | Hexamethyldisiloxane Film as the Bottom Antireflective Coating Layer for ArF Excimer Laser Lithography | Chen, Hsuen-Li ; Wang, Lon A. | Applied Optics | 13 | 12 | |
1999 | Hexamethyldisiloxane Film as the Bottom Antireflective Coating Layer for ArF Excimer Laser Lithography | HSUEN-LI CHEN ; LON A. WANG | Applied Optics | 13 | 12 | |
2003 | High efficiency purification method for multi-walled carbon nanotubes | Ko, C.-J.; Lee, C.-Y.; Ko, F.-H.; Chen, H.L.; Chu, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | | | |
2004 | High reflectance of reflective-type attenuated-phase-shifting masks for extreme ultraviolet lithography with high inspection contrast in deep ultraviolet regimes | Chen, H.L.; Cheng, H.C.; Ko, T.S.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | | | |
2002 | Highly effective chemical route for the preparation of uniform nanometer gold particles by microwave irradiation | Liu, F.-K.; Ker, C.-J.; Ko, F.-H.; Chen, H.-L.; Dai, B.-T.; HSUEN-LI CHEN | 2002 International Microprocesses and Nanotechnology Conference, MNC 2002 | | | |
2004 | Highly efficient microwave-assisted purification of multiwalled carbon nanotubes | Ko, C.-J.; Lee, C.-Y.; Ko, F.-H.; Chen, H.-L.; Chu, T.-C.; HSUEN-LI CHEN | Microelectronic Engineering | | | |
2014 | Highly reflective liquid mirrors: Exploring the effects of localized surface plasmon resonance and the arrangement of nanoparticles on metal liquid-like films | Yen, Y.-T.; Lu, T.-Y.; Lee, Y.-C.; Yu, C.-C.; Tsai, Y.-C.; Tseng, Y.-C.; Chen, H.-L.; HSUEN-LI CHEN | ACS Applied Materials and Interfaces | | | |