公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2019 | A Nanodisk array based localized surface plasmon resonance (lspr) sensor fabricated by laser interference lithography | Lin, C.-C.; Chen, J.-S.; Wu, C.-L.; Wang, L.A.; LON A. WANG ; NIEN-TSU HUANG | Proceedings of the 14th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2019 | 1 | 0 | |
2001 | Negative-tone cycloolefin photoresist for 193-nm lithography | Fu, ShihChi; KUO-HUANG HSIEH ; LON A. WANG | Proceedings of SPIE - The International Society for Optical Engineering | 4 | 0 | |
2000 | Novel bottom antireflective coating working for both KrF and ArF excimer laser lithography | HSUEN-LI CHEN ; LON A. WANG | Microelectronic Engineering | 0 | 0 | |
2015 | A novel fabrication of fiber Bragg grating in hollow-core fiber with HPDLCs | Hsu, C.-H.; Choi, W.-K.; WING-KIT CHOI ; LON A. WANG | Proceedings of SPIE - The International Society for Optical Engineering | 1 | 0 | |
1998 | Novel implementation method to realize all-optical logic gates | LON A. WANG ; Chang, S. H.; Lin, Y. F. | Optical Engineering | 11 | 9 | |
2007 | A novel method for fabrication of plastic microlens array with aperture stops for projection photolithography | Chang, C.-Y.; SEN-YEU YANG ; Wu, M.-S.; Jiang, L.-T.; LON A. WANG | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 9 | 9 | |
2023 | A novel polished conical silicon-cored-fiber based edge coupler for silicon photonics | Yang, Sung Pu; CHAO-HSIN WU ; LON A. WANG | 2023 Opto-Electronics and Communications Conference, OECC 2023 | 0 | 0 | |
2017 | A novel silicon microsphere based optical fiber probe for refractive index sensing applications | Chang, S.-S.; Chen, J.-H.; Chen, G.-H.; LON A. WANG | International Conference on Optical MEMS and Nanophotonics | | | |
2009 | One-Shot Deep-UV–Pulsed Laser-Induced Photomodification of Hollow Metal Nanoparticles for High Density Data Storage on Flexible Substrates | Wan, Dehui; Chen, Hsuen-Li ; Tseng, Shao-Chin; Wang, Lon A.; Chen, Yung-Pin; LON A. WANG | ACS Nano | 24 | 23 | |
1998 | Optical Characteristics and Irradiation Stability of PECVD-Grown Sinx Films Prepared for DUV Attenuated Phase Shifting Masks | L. A. Wang,; H. L. Chen,; C. W. Hsu,; L. S. Yeh,; LON A. WANG | 42th EIPBN | | | |
1989 | Optical clock signal distribution with holographic optical elements | Kostuk R.K; LON A. WANG ; Huang Y.-T. | Proceedings of SPIE - The International Society for Optical Engineering | 10 | 0 | |
2006 | Optical coupling between a lensed photonic crystal fiber and a laser diode | Peng, Z.-S.; LON A. WANG | 2006 International Conference on Communications, Circuits and Systems, ICCCAS, Proceedings | 8 | 0 | |
1999 | Optical coupling between single-mode fibers with the aid of a long-period fiber grating | W. T. Chen; L. A. Wang; LON A. WANG | Electronics Letters | | | |
1999 | Optical coupling between singlemode fibres by utilising long-period fibre gratings | Chen, W.T.; LON A. WANG | Electronics Letters | 7 | 3 | |
2000 | Optical Coupling Method Utilizing a Lensed Fiber Integrated With a Long-Period Fiber Grating | Chen, Wen Tzung; LON A. WANG | Applied Optics | 14 | 11 | |
2001 | Optical properties of CrO/ZrO optical superlattice for attenuated phase shifting mask at 193 nm wavelength | Lai, F. D.; LON A. WANG | Microelectronic Engineering | 3 | 3 | |
2001 | Optical-Constant Tunable (ZrO<sub>2</sub>)<sub>x</sub>/(Cr<sub>2</sub>O<sub>3</sub>)<sub>y</sub>/(Al<sub>2</sub>O<sub>3</sub>)<sub>1-x-y</sub> Optical Superlattice for APSM in ArF Lithography | F. D. Lai; L. A. Wang; LON A. WANG | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | 3 | 3 | |
2001 | Optical-constant Tunable AlO/CrO/ZrO Optical Superlattices for APSM working in ArF Lithography | L. A. Wang; F.D. Lai; LON A. WANG | 45th EIPBN | | | |
1999 | Optimization of ECR-PECVD Grown HMDSO Films for The Bottom Antireflective Coating Layer in ArF Lithography | L. A. Wang; H. L. Chen; LON A. WANG | 43th EIPBN | | | |
2000 | Optimized bilayer hexamethyldisiloxane film as bottom antireflective coating for both KrF and ArF lithographies | Lin, C.H.; HSUEN-LI CHEN ; LON A. WANG | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | 6 | 5 | |