公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
1990 | 4-Channel, 622 Mb/s Medium-Density WDM System with Fabry-Perot Laser Diodes for Subscriber Loop Applications | 王倫; Chapuran, T. E.; Menendez, R. C.; Wang, L. A. | Proceedings of SPIE | | | |
1999 | Comparison of Er-doped superfluorescent fiber sources in double pass configurations | Wang, L. A.; Chen, C.D. | J. of the Chinese Institute of Electrical Engineering | | | |
2000 | Corrugated long period fiber gratings as band-rejection filters | Lin, C. Y.; Wang, L. A.; LON A. WANG | Optics InfoBase Conference Papers | 0 | | |
1992 | DFB Laser Array for WDM Applications | 王倫; Lo, Y. H.; Wang, L. A. | LEOS'92, Boston(1992.11) | | | |
1989 | Direct Formation of Planar Holograms and Noise Gratings at 820 nm in Bleached Silver-Halide Emulsions | 王倫; Kostuk, R.; Wang, L. A. | Optical Letters | | | |
1990 | Efficient Multiple-Image Holographic Optical Element | 王倫; Geng, W. Z; Kostuk, R.; Wang, L. A. | Optical Engineering | | | |
1995 | Electrical Crosstalk and Optical Coupling for Packaging a High-Speed Intergrated DFB Laser Array | 王倫; Hwang, J. Y.; Lin, M. S.; Su, C. D.; Wang, L. A. | The Optical Fiber | | | |
1999 | Fabrication of sub-quarter-micron grating patterns by employing DUV holographic lithography | Wang, L. A.; Lin, C. H.; Chen, J. H. | Microelectronic Engineering | | | |
2001 | Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithography | Lin, C. H.; Wang, L. A. | Journal of | | | |
1992 | Integrated Four-Wavelength DFB Laser Array with 10 Gb/S Speed and 5 nm Continuous Tuning Range | 王倫; Lo, Y. H.; Gozdz, A. S.; Lin, P. S. D.; Iqbal, M.; Bhat, R.; Wang, L. A. | IEEE Photonics Technology Letters | | | |
2003 | Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications | Chen, H. L.; Chuang, Y. F.; Lee, C. C.; Hsieh, C. I.; Ko, F. H.; Wang, L. A. | Microelectronic Engineering 67-68: | | | |
1991 | Low-Threshold Four-Wavelength DFB Laser Array for Multi-Gigabit/S High- Density WDM System Applications | 王倫; Lo, Y. H.; Iqbal, M. Z.; Young, J.; Lin, P. S. D.; Gozdz, A. S.; Wang, L. A. | IEEE Photonics Technology Letters | | | |
1991 | Medium-Density WDM System with Fabry-Perot Laser Diodes for Subscriber Loop Applications | 王倫; Chapuran, T. E.; Menendez, R. C.; Wang, L. A. | IEEE Photonics Technology Letters | | | |
1991 | Multi-Channel Optoelectronic Integrated Circuit Receiver with Switching Function for Wavelength-Division-Multiplexing Networks | 王倫; Rouge, K.; Hong, W.; Chang, G.; Wang, L. A. | The Conference on Lasers and Electro-Optics | | | |
1991 | Multi-gigabit/s Operation of a Low-Threshold Four-Wavelength DFB Laser Array for High-Density WDM Applications | 王倫; Lo, Y.; Iqbal, M.; Wang, L. A. | ECOC'and IOOC'91 | | | |
2001 | Optical-constant tunable (ZrO2)x/(Cr2O3)y/(Al2O3)1–x–y optical superlattices for attenuated phase shift mask in ArF lithography | Lai, F. D.; Wang, L. A. | Journal of | | | |
2003 | Phase masks fabricated by interferometric lithography for working in 248 nm wavelength | Cheng, W. C.; Wang, L. A.; Hsieh, C. Y. | Microelectronic Engineering 67-68: | | | |
2003 | Phase masks working in 157 nm wavelength fabricated by immersion interference photolithography | Cheng, W. C.; Wang, L. A. | Journal of | | | |
2003 | Ultra-thin Cr2O3 well-crystallized films for high transmittance APSM in ArF line | Lai, F. D.; Huang, C. Y.; Chang, C. M.; Wang, L. A.; Cheng, W. C. | Microelectronic Engineering 67-68: | | | |
2003 | Ultrathin TiO2 amorphous films for high transmittance APSM blanks at 157 and 193 nm wavelength simultaneously | Lai, F. D.; Chang, C. M.; Wang, L. A.; Yih, T. S. | Journal of | | | |