公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2019 | High chemical resistance and Raman enhancement in Ag/Al <inf>2</inf> O <inf>3</inf> core-shell plasmonic nanostructures tailored by atomic layer deposition | Yang, P.-S.; Yin, Y.-T.; Lin, P.-C.; Chen, L.-Y.; Chen, M.-J.; MIIN-JANG CHEN | Materials Chemistry and Physics | | | |
2017 | High performance complementary Ge peaking FinFETs by room temperature neutral beam oxidation for sub-7 nm technology node applications | Lee, Y.-J.; Hong, T.-C.; Hsueh, F.-K.; Sung, P.-J.; Chen, C.-Y.; Chuang, S.-S.; Cho, T.-C.; Noda, S.; Tsou, Y.-C.; Kao, K.-H.; Wu, C.-T.; Yu, T.-Y.; Jian, Y.-L.; Su, C.-J.; Huang, Y.-M.; Huang, W.-H.; Chen, B.-Y.; Chen, M.-C.; Huang, K.-P.; Li, J.-Y.; Chen, M.-J.; Li, Y.; Samukawa, S.; Wu, W.-F.; Huang, G.-W.; Shieh, J.-M.; Tseng, T.-Y.; Chao, T.-S.; Wang, Y.-H.; MIIN-JANG CHEN ; JIUN-YUN LI | Technical Digest - International Electron Devices Meeting, IEDM | 8 | 0 | |
2019 | High- K Gate Dielectrics Treated with in Situ Atomic Layer Bombardment | Chang T.-J; Lee W.-H; Wang C.-I; Yi S.-H; Yin Y.-T; Lin H.-C; HSIN-CHIH LIN ; MIIN-JANG CHEN | ACS Applied Electronic Materials | 19 | 19 | |
2023 | High-quality AlN epilayers prepared by atomic layer deposition and large-area rapid electron beam annealing | Kao, Wei Chung; Jhong, Fong Jyun; Yin, Yu Tung; HSIN-CHIH LIN ; MIIN-JANG CHEN | Materials Chemistry and Physics | 1 | 1 | |
2000 | Hot carrier recombination model of visible electroluminescence from metal oxide silicon tunneling diodes | CHEE-WEE LIU ; Chang, S. T.; Liu, W. T.; MIIN-JANG CHEN ; CHING-FUH LIN | Applied Physics Letters | 23 | 20 | |
2016 | Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC) | Wang, L.-C.; YIN-YI HAN ; Yang, K.-C.; Chen, M.-J.; Lin, H.-C.; Lin, C.-K.; HSIN-CHIH LIN ; MIIN-JANG CHEN | Surface and Coatings Technology | 35 | 32 | |
2021 | Impact of a TiN Capping Layer on Phase Transformation and Capacitance Enhancement in ZrO2 | Wang C.-Y; Wang C.-I; Yi S.-H; Chang T.-J; Chou C.-Y; Yin Y.-T; Lin H.-C; HSIN-CHIH LIN ; MIIN-JANG CHEN | ACS Applied Electronic Materials | 4 | 5 | |
2024 | Impact of asymmetric electrodes on ferroelectricity of sub-10 nm HZO thin films | Chen, Hsing Yang; Jiang, Yu Sen; Chuang, Chun Ho; Mo, Chi Lin; Wang, Ting Yun; HSIN-CHIH LIN ; MIIN-JANG CHEN | Nanotechnology | 0 | 0 | |
2023 | Impact of monolayer engineering on ferroelectricity of sub-5 nm Hf0.5Zr0.5O2 thin films | Wang, Ting Yun; Mo, Chi Lin; Chou, Chun Yi; Chuang, Chun Ho; MIIN-JANG CHEN | Acta Materialia | 0 | 0 | |
2015 | Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics | Huang, J.-J.; Tsai, Y.-J.; Tsai, M.-C.; Huang, L.-T.; Lee, M.-H.; Chen, M.-J.; MIIN-JANG CHEN | Applied Surface Science | | | |
2011 | Improved characteristics of near-band-edge and deep-level emissions from ZnO nanorod arrays by atomic-layer-deposited Al2O3 and ZnO shell layers | Sun, Wen-Cheng; Yeh, Yu-Cheng; Ko, Chung-Ting; He, Hau, Jr.; Chen, Miin-Jang | Nanoscale Research Letters | 44 | 46 | |
2013 | Improvement in electrical characteristics of HfO <inf>2</inf> gate dielectrics treated by remote NH <inf>3</inf> plasma | Huang, L.-T.; Chang, M.-L.; Huang, J.-J.; Lin, H.-C. ; Kuo, C.-L. ; Lee, M.-H.; CHEE-WEE LIU ; MIIN-JANG CHEN | Applied Surface Science | 11 | 11 | |
2022 | Improvement of Corrosion Resistance and Biocompatibility of Biodegradable Mg–Ca Alloy by ALD HfZrO2 Film | Lin P.-C; Lin K; Lin Y.-H; Yang K.-C; Semenov V.I; Lin H.-C; HSIN-CHIH LIN ; MIIN-JANG CHEN | Coatings | 1 | 1 | |
2012 | Improvement of oxidation resistance of copper by atomic layer deposition | Chang M.L.; Cheng T.C.; Lin M.C.; HSIN-CHIH LIN ; MIIN-JANG CHEN | Applied Surface Science | 30 | 29 | |
2010 | Improvement of wear and cavitation-erosion by ALD-deposited LiAlxOy films on an Mg-10Li-0.5Zn alloy | Wang, P.C.; Shih, Y.T.; Lin, M.C.; Lin, H.C.; Chen, M.J.; Lin, K.M.; HSIN-CHIH LIN ; MIIN-JANG CHEN | Surface and Coatings Technology | 10 | 8 | |
2016 | In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics | Tsai M.-C.; Lee M.-H.; Kuo C.-L. ; HSIN-CHIH LIN ; MIIN-JANG CHEN | Applied Surface Science | 5 | 5 | |
2017 | Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing | Lin B.-T.; Lu Y.-W.; Shieh J.; TZONG-LIN JAY SHIEH ; MIIN-JANG CHEN | Journal of the European Ceramic Society | 70 | 63 | |
2017 | Influence of homo-buffer layers and post-deposition rapid thermal annealing upon atomic layer deposition grown ZnO at 100 °C with three-pulsed precursors per growth cycle | Cheng, Y.-C.; Yuan, K.-Y.; Chen, M.-J.; MIIN-JANG CHEN | Journal of Crystal Growth | | | |
2000 | Infrared electroluminescence from metal-oxide-semiconductor structures on silicon | Lin, Ching-Fuh ; Liu, C. W.; Chen, Miin-Jang ; Lee, M. H.; CHEE-WEE LIU | Journal of Physics: Condensed Matter | 7 | 7 | |
2015 | Investigation of defects in ultra-thin Al 2 O 3 films deposited on pure copper by the atomic layer deposition technique | Chang M.L.; Wang L.C.; Lin H.C. ; Chen M.J. ; Lin K.M. | Applied Surface Science | 22 | 21 | |