公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2021 | Impact of a TiN Capping Layer on Phase Transformation and Capacitance Enhancement in ZrO2 | Wang C.-Y; Wang C.-I; Yi S.-H; Chang T.-J; Chou C.-Y; Yin Y.-T; Lin H.-C; HSIN-CHIH LIN ; MIIN-JANG CHEN | ACS Applied Electronic Materials | 4 | 5 | |
2024 | Impact of asymmetric electrodes on ferroelectricity of sub-10 nm HZO thin films | Chen, Hsing Yang; Jiang, Yu Sen; Chuang, Chun Ho; Mo, Chi Lin; Wang, Ting Yun; HSIN-CHIH LIN ; MIIN-JANG CHEN | Nanotechnology | 0 | 0 | |
2023 | Impact of monolayer engineering on ferroelectricity of sub-5 nm Hf0.5Zr0.5O2 thin films | Wang, Ting Yun; Mo, Chi Lin; Chou, Chun Yi; Chuang, Chun Ho; MIIN-JANG CHEN | Acta Materialia | 0 | 0 | |
2015 | Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics | Huang, J.-J.; Tsai, Y.-J.; Tsai, M.-C.; Huang, L.-T.; Lee, M.-H.; Chen, M.-J.; MIIN-JANG CHEN | Applied Surface Science | | | |
2011 | Improved characteristics of near-band-edge and deep-level emissions from ZnO nanorod arrays by atomic-layer-deposited Al2O3 and ZnO shell layers | Sun, Wen-Cheng; Yeh, Yu-Cheng; Ko, Chung-Ting; He, Hau, Jr.; Chen, Miin-Jang | Nanoscale Research Letters | 44 | 46 | |
2013 | Improvement in electrical characteristics of HfO <inf>2</inf> gate dielectrics treated by remote NH <inf>3</inf> plasma | Huang, L.-T.; Chang, M.-L.; Huang, J.-J.; Lin, H.-C. ; Kuo, C.-L. ; Lee, M.-H.; CHEE-WEE LIU ; MIIN-JANG CHEN | Applied Surface Science | 11 | 11 | |
2022 | Improvement of Corrosion Resistance and Biocompatibility of Biodegradable Mg–Ca Alloy by ALD HfZrO2 Film | Lin P.-C; Lin K; Lin Y.-H; Yang K.-C; Semenov V.I; Lin H.-C; HSIN-CHIH LIN ; MIIN-JANG CHEN | Coatings | 1 | 1 | |
2012 | Improvement of oxidation resistance of copper by atomic layer deposition | Chang M.L.; Cheng T.C.; Lin M.C.; HSIN-CHIH LIN ; MIIN-JANG CHEN | Applied Surface Science | 30 | 29 | |
2010 | Improvement of wear and cavitation-erosion by ALD-deposited LiAlxOy films on an Mg-10Li-0.5Zn alloy | Wang, P.C.; Shih, Y.T.; Lin, M.C.; Lin, H.C.; Chen, M.J.; Lin, K.M.; HSIN-CHIH LIN ; MIIN-JANG CHEN | Surface and Coatings Technology | 10 | 8 | |
2016 | In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics | Tsai M.-C.; Lee M.-H.; Kuo C.-L. ; HSIN-CHIH LIN ; MIIN-JANG CHEN | Applied Surface Science | 5 | 5 | |
2017 | Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing | Lin B.-T.; Lu Y.-W.; Shieh J.; TZONG-LIN JAY SHIEH ; MIIN-JANG CHEN | Journal of the European Ceramic Society | 70 | 63 | |
2017 | Influence of homo-buffer layers and post-deposition rapid thermal annealing upon atomic layer deposition grown ZnO at 100 °C with three-pulsed precursors per growth cycle | Cheng, Y.-C.; Yuan, K.-Y.; Chen, M.-J.; MIIN-JANG CHEN | Journal of Crystal Growth | | | |
2000 | Infrared electroluminescence from metal-oxide-semiconductor structures on silicon | Lin, Ching-Fuh ; Liu, C. W.; Chen, Miin-Jang ; Lee, M. H.; CHEE-WEE LIU | Journal of Physics: Condensed Matter | 7 | 7 | |
2015 | Investigation of defects in ultra-thin Al 2 O 3 films deposited on pure copper by the atomic layer deposition technique | Chang M.L.; Wang L.C.; Lin H.C. ; Chen M.J. ; Lin K.M. | Applied Surface Science | 22 | 21 | |
2020 | Leakage current lowering and film densification of ZrO 2 high-k gate dielectrics by layer-by-layer, in-situ atomic layer hydrogen bombardment | Huang, K.-W.; Chang, T.-J.; Wang, C.-Y.; Yi, S.-H.; Wang, C.-I.; Jiang, Y.-S.; Yin, Y.-T.; Lin, H.-C.; Chen, M.-J.; HSIN-CHIH LIN ; MIIN-JANG CHEN | Materials Science in Semiconductor Processing | | | |
2004 | Light emission from Al/HfO2/silicon diodes | Chen, T. C.; Lai, W. Z.; Liang, C. Y.; MIIN-JANG CHEN ; Lee, L. S.; CHEE-WEE LIU | Journal of Applied Physics | 10 | 10 | |
2002 | Light sources for photonic circuitry based on Si | CHING-FUH LIN ; Liang, Eih-Zhe; Su, Ting-Wien; Hsieh, Hsing-Hung; WEI-FANG SU ; MIIN-JANG CHEN | Conference on Quantum Electronics and Laser Science (QELS) - Technical Digest Series | 0 | 0 | |
2012 | Local electronic structure and UV electroluminescence of n-ZnO:N/p-GaN heterojunction LEDs grown by remote plasma atomic layer deposition | Chien, J.F.; Chen, C.H.; Shyue, J.J.; Chen, M.J.; MIIN-JANG CHEN | Materials Research Society Symposium Proceedings | | | |
2012 | Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping | Chien, Jui-Fen; Chen, Ching-Hsiang; Shyue, Jing-Jong; Chen, Miin-Jang | ACS Applied Materials & Interfaces | 31 | 29 | |
2017 | Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing | Shih H.-Y.; Lee W.-H.; Kao W.-C.; Chuang Y.-C.; Lin R.-M.; Lin H.-C.; Shiojiri M.; HSIN-CHIH LIN ; MIIN-JANG CHEN | Scientific Reports | 76 | 75 | |