第 1 到 48 筆結果,共 48 筆。
公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 | |
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1 | 2011 | Using one-step, dual-side nanoimprint lithography to fabricate low-cost, highly flexible wave plates exhibiting broadband antireflection | Yu, C.C.; Chen, Y.T.; Wan, D.H.; Chen, H.L.; Ku, S.L.; HSUEN-LI CHEN | Journal of the Electrochemical Society | 8 | 8 | |
2 | 2010 | Using KrF laser to induce photomodification of hollow metal nanoparticles for optical data storage | Wan, D.H.; Tseng, S.C.; Chen, H.L.; Wang, L.A.; Chen, Y.-P.; HSUEN-LI CHEN | Technical Digest - 15th OptoElectronics and Communications Conference, OECC2010 | |||
3 | 2010 | Exploiting optical properties of P3HT:PCBM films for organic solar cells with semitransparent anode | Lee, W.H.; Chuang, S.Y.; Chen, H.L.; Su, W.F.; WEI-FANG SU ; HSUEN-LI CHEN | Thin Solid Films | 68 | 66 | |
4 | 2009 | Extraordinary transmittance in three-dimensional crater, pyramid, and hole-array structures prepared through reversal imprinting of metal films | Chen, H.L.; Chuang, S.Y.; Lee, W.H.; Kuo, S.S.; Su, W.F.; Ku, S.L.; WEI-FANG SU ; HSUEN-LI CHEN | Optics Express | 17 | 16 | |
5 | 2009 | Reduction of polarization and swing effects in a high numerical aperture exposure system by utilizing resist antireflective coatings | Chen, H.L.; Lee, W.H.; Fan, W.; Chuang, S.Y.; Lai, Y.H.; Lee, C.C.; HSUEN-LI CHEN | Microelectronic Engineering | |||
6 | 2008 | Using optical thin film model to optimize thermal annealing procedure in P3HT:PCBM blend based solar cells | Lee, W.H.; Chen, H.L.; Chuang, S.Y.; Chen, T.H.; WEI-FANG SU ; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | 2 | 0 | |
7 | 2008 | Using self-assembled nanoparticles to fabricate and optimize subwavelength textured structures in solar cells | Wan, D.H.; Chen, H.L.; Yu, C.C.; Lee, Y.C.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | |||
8 | 2008 | Active modulation of surface plasmon resonance wavelengths by applying an electric field to gold nanoparticle-embedded ferroelectric films | Hsieh, K.C.; Chen, H.L.; Wan, D.H.; Shieh, J.; HSUEN-LI CHEN | Journal of Physical Chemistry C | |||
9 | 2008 | Using direct nanoimprinting of ferroelectric films to prepare devices exhibiting bi-directionally tunable surface plasmon resonances | Chen, H.L.; Hsieh, K.C.; Lin, C.H.; Chen, S.H.; HSUEN-LI CHEN | Nanotechnology | |||
10 | 2008 | Using Self-Assembled nanoparticles to fabricate and optimize subwavelength textured structures in solar cells | Wan, D.H.; Chen, H.L.; Chuang, S.Y.; Yu, C.C.; Lee, Y.C.; HSUEN-LI CHEN | Journal of Physical Chemistry C | |||
11 | 2008 | Using direct nanoimprinting to study extraordinary transmission in textured metal films | Chuang, S.Y.; Chen, H.L.; Kuo, S.S.; Lai, Y.H.; Lee, C.C.; HSUEN-LI CHEN | Optics Express | |||
12 | 2007 | Fabrication of sub-wavelength antireflective structures in solar cells by utilizing modified illumination and defocus techniques in optical lithography | Chen, H.L.; Huang, K.T.; Lin, C.H.; Wang, W.Y.; Fan, W.; HSUEN-LI CHEN | Microelectronic Engineering | |||
13 | 2007 | Fabrication of gold-nanoparticle-infiltrated inverse opal structures with both photonic bandgap and surface plasmon resonance characteristics | Chen, H.L.; Lin, Y.H.; Chuang, S.Y.; Wan, D.H.; Lin, C.H.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC | |||
14 | 2007 | Using colloidal lithography to fabricate and optimize sub-wavelength pyramidal and honeycomb structures in solar cells | Chen, H.L.; Chuang, S.Y.; Lin, C.H.; Lin, Y.H.; HSUEN-LI CHEN | Optics Express | |||
15 | 2006 | Fabrication of texturing antireflection structures in solar cells by using the defocusing exposure in optical lithography | Chen, H.L.; Fan, W.; Cheng, C.C.; Lin, C.H.; Huang, K.T.; HSUEN-LI CHEN | Journal of the Electrochemical Society | |||
16 | 2006 | Directly patterning metal films by nanoimprint lithography with low-temperature and low-pressure | Chen, H.L.; Chuang, S.Y.; Cheng, H.C.; Lin, C.H.; Chu, T.C.; HSUEN-LI CHEN | Microelectronic Engineering | |||
17 | 2006 | Directly patterning ferroelectric films by nanoimprint lithography with low temperature and low pressure | Hsieh, K.C.; Chen, H.L.; Lin, C.H.; Lee, C.Y.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | |||
18 | 2005 | Rapidly selective growth of nanoparticles by electron-beam and optical lithographies with chemically amplified resists | Chen, H.L.; Chu, Y.H.; Kuo, C.I.; Liu, F.K.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Electrochemical and Solid-State Letters | |||
19 | 2004 | Optical properties of two-dimensional photonic-bandgap crystals characterized by spectral ellipsometry | Hsieh, C.I.; Chen, H.L.; Chao, W.C.; Ko, F.H.; HSUEN-LI CHEN | Microelectronic Engineering | |||
20 | 2004 | Fabrication of autocloned photonic crystals by using high-density-plasma chemical vapor deposition | Chen, H.L.; Lee, H.F.; Chao, W.C.; Hsieh, C.I.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | |||
21 | 2004 | Nanoparticle-assisted growth of porous germanium thin films | Shieh, J.; Chen, H.L.; Ko, T.S.; Cheng, H.C.; Chu, T.C.; HSUEN-LI CHEN | Advanced Materials | |||
22 | 2004 | Low-temperature growth of germanium quantum dots on Silicon Oxide by inductively coupled plasma CVD | Shieh, J.; Ko, T.S.; Chen, H.L.; Dai, B.T.; Chu, T.C.; HSUEN-LI CHEN | Chemical Vapor Deposition | |||
23 | 2004 | High reflectance of reflective-type attenuated-phase-shifting masks for extreme ultraviolet lithography with high inspection contrast in deep ultraviolet regimes | Chen, H.L.; Cheng, H.C.; Ko, T.S.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | |||
24 | 2003 | High efficiency purification method for multi-walled carbon nanotubes | Ko, C.-J.; Lee, C.-Y.; Ko, F.-H.; Chen, H.L.; Chu, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | |||
25 | 2003 | Enhance Extreme UltraViolet Lithography mask inspection contrast by using Fabry-Perot type antireflective coatings | Cheng, H.C.; Chen, H.L.; Ko, T.S.; Lai, L.J.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | |||
26 | 2003 | Fabry-Perot type antireflective coatings for binary mask applications in ArF and F <inf>2</inf> excimer laser lithographies | Chen, H.L.; Lee, C.C.; Chuang, Y.F.; Liu, M.C.; Hsieh, C.I.; Ko, F.H.; HSUEN-LI CHEN | Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest | |||
27 | 2003 | Patterning of self-assembled nanoparticles by electron-beam lithography with chemically amplified resists | Kuo, C.I.; Chen, H.L.; Chu, Y.H.; Liu, F.K.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | |||
28 | 2003 | Porous materials with ultra-low dielectric constant as antireflective coating layers for F 2 and ArF lithography | Chen, H.L.; Tu, C.W.; Wang, T.J.; Liu, P.T.; Ko, F.H.; Chung, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | |||
29 | 2003 | Optical-gradient type of antireflective coatings for sub-70 nm optical lithography applications | Chen, H.L.; Fan, W.; Wang, T.J.; Ko, F.H.; Zhai, R.S.; Hsu, C.K.; Chuang, T.J.; HSUEN-LI CHEN | Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest | |||
30 | 2003 | Characterized optical constants of thin films for vacuum ultraviolet lithography applications | Fan, W.; Chen, H.L.; Wu, C.L.; Chang, L.K.S.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | |||
31 | 2003 | Fabry-Perot type antireflective coatings for binary mask applications in ArF and F<inf>2</inf>excimer laser lithographies | Chen, H.L.; Lee, C.C.; Chuang, Y.F.; Liu, M.C.; Hsieh, C.I.; Ko, F.H.; HSUEN-LI CHEN | Electrochemical and Solid-State Letters | |||
32 | 2003 | Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications | Chen, H.L.; Chuang, Y.F.; Lee, C.C.; Hsieh, C.I.; Ko, F.H.; LON A. WANG ; HSUEN-LI CHEN | Microelectronic Engineering | 0 | 0 | |
33 | 2002 | Diluted low dielectric constant materials as bottom antireflective coating layers for both KrF and ArF lithography | Chen, H.L.; Chao, W.C.; Ko, F.H.; Chu, T.C.; Cheng, H.C.; HSUEN-LI CHEN | 2002 International Microprocesses and Nanotechnology Conference, MNC 2002 | |||
34 | 2002 | Novel bilayer bottom antireflective coating structure for high-performance ArF lithography applications | Chen, H.L.; Chao, W.C.; Ko, F.H.; Chu, T.C.; Huang, T.Y.; HSUEN-LI CHEN | Journal of Microlithography, Microfabrication and Microsystems | |||
35 | 2002 | Low-dielectric constant FLARE 2.0 films for bottom antireflective coating layers in KrF lithography | Chen, H.L.; Cheng, H.C.; Li, M.Y.; Ko, F.H.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Solid-State Electronics | |||
36 | 2002 | Multilayer bottom antireflective coatings for high numerical aperture and modified illumination exposure systems | Chen, H.L.; Fan, W.; Wang, T.J.; Ko, F.H.; Hsieh, C.I.; HSUEN-LI CHEN | 2002 International Microprocesses and Nanotechnology Conference, MNC 2002 | |||
37 | 2002 | Multi-layer bottom antireflective coating structures for high NA ArF exposure system applications | Chen, H.L.; Fan, W.; Wang, T.J.; Huang, T.Y.; HSUEN-LI CHEN | Proceedings of SPIE-The International Society for Optical Engineering | |||
38 | 2002 | Thermal-flow techniques for sub-35 nm contact-hole fabrication in electron-beam lithography | Chen, H.L.; Chen, C.H.; Ko, F.H.; Chu, T.C.; Pan, C.T.; Lin, H.C.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | |||
39 | 2002 | Low alkaline contamination bilayer bottom antireflective coatings in F<inf>2</inf> excimer laser lithography | Chen, H.L.; Chuang, Y.F.; Lee, C.C.; Ko, F.H.; Hsieh, C.I.; Huang, T.Y.; HSUEN-LI CHEN | Electrochemical and Solid-State Letters | |||
40 | 2001 | Reduction of substrate alkaline contamination by utilizing multi-layer bottom antireflective coating structures in ArF lithography | Chen, H.L.; Shih, M.C.; Hsieh, C.F.; Chen, B.C.; Ko, F.H.; HSUEN-LI CHEN | 2001 International Microprocesses and Nanotechnology Conference, MNC 2001 | |||
41 | 2001 | Thermal flow and chemical shrink techniques for sub-100 nm contact hole fabrication in electron beam lithography | Chen, H.L.; Ko, F.H.; Li, L.S.; Hsu, C.K.; Chen, B.C.; Chu, T.C.; Huang, T.Y.; HSUEN-LI CHEN | 2001 International Microprocesses and Nanotechnology Conference, MNC 2001 | |||
42 | 2001 | Low dielectric constant SILK films as bottom antireflective coating layers for both KrF and ArF lithography | Chen, H.L.; Ko, F.H.; Chu, T.C.; Cheng, H.C.; Huang, T.Y.; HSUEN-LI CHEN | 2001 International Microprocesses and Nanotechnology Conference, MNC 2001 | |||
43 | 2001 | A Fabry-Perot type anti-reflective coating for deep ultraviolet binary photomask application | Chen, H.L.; Hsu, C.K.; Chen, B.C.; Ko, F.H.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | |||
44 | 2001 | Study of cladding layer for photonic integrated circuits | Hsu, C.W.; Wang, W.S.; Chen, H.L.; Wang, T.J.; Huang, Y.H.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | |||
45 | 2001 | Low dielectric constant FLARE 2.0 films as bottom antireflective coating layers for ArF lithography | Chen, H.L.; Cheng, H.C.; Li, M.Y.; Ko, F.H.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | |||
46 | 2001 | Multimode interference couplers using polymeric optical waveguides | Hsu, C.W.; Chen, H.L.; Wang, W.S.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | |||
47 | 2001 | Low-dielectric constant bisbenzo(cyclobutene) and fluorinated poly(arylene)ether films as bottom anti-reflective coating layers for ArF lithography | Chen, H.L.; Chu, T.C.; Li, M.Y.; Ko, F.H.; Cheng, H.C.; Huang, T.Y.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | |||
48 | 2001 | Studies of chemically amplified deep UV resists for electron beam lithography applications | Chen, H.L.; Hsu, C.K.; Chen, B.C.; Ko, F.H.; Yang, J.Y.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering |