公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2014 | Direct-scatterometry-enabled PEC model calibration with two-dimensional layouts | Yang, Y.-Y.; Lee, H.-P.; Liu, C.-H.; Yu, H.-Y.; Tsai, K.-Y.; KUEN-YU TSAI ; JIA-HAN LI | Proceedings of SPIE - The International Society for Optical Engineering | 0 | 0 | |
2004 | DQIT: μ-synthesis without D-scale fitting | Kuen-Yu Tsai*; Haitham A. Hindi; KUEN-YU TSAI | IEEE Transactions on Automatic Control | 1 | 0 | |
2009 | Effects of Fresnel zone plate fabrication errors on focusing performances | Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2009 | | | |
2021 | Efficient electrical characteristics estimation techniques for sub-20-nm FDSOI integrated circuits with nonrectangular gate patterning effects | Cai J.-S; Chien S.-W; Zheng X.-Y; Lee C.-L; KUEN-YU TSAI | Journal of Micro/Nanopatterning, Materials and Metrology | | | |
2010 | Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method | Lee, Y.-M.; Li, J.-H.; Ng, P.C.W.; Pei, T.-H.; Wang, F.-M.; Tsai, K.-Y.; KUEN-YU TSAI ; JIA-HAN LI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 2 | 3 | |
2013 | Electron Beam Exposure Apparatus, Electron Beam Generation Apparatus and Exposure Method (電子束曝光裝置、電子束產生裝置及曝光方法) | Yu-Hsuan Kuo; Ming-Shing Su; Yi-Chang Lu; Kuen-Yu Tsai; KUEN-YU TSAI | | | | |
2014 | Electron-Beam Lithographic Method, System and Method For Controlling Electron-Beam Servo (電子束微影方法、電子束微影伺服控制方法及系統) | Jia-Yush Yen; Kuen-Yu Tsai; Lien-Sheng Chen; Pablo Chiu; Hsin-Fan Tsai; KUEN-YU TSAI | | | | |
2012 | Electron-beam proximity effect model calibration for fabricating scatterometry calibration samples | Yu-Tian Shen; Liu, C.-H.; Chen, C.-Y.; Ng, H.-T.; Tsai, K.-Y.; Wang, F.-M.; Kuan, C.-H.; Lee, Y.-M.; Cheng, H.-H.; Li, J.-H.; KUEN-YU TSAI ; CHIEH-HSIUNG KUAN ; JIA-HAN LI | Advanced Lithography - Proceeding of SPIE | 3 | 0 | |
2014 | The electrostatic potential inside the electron-optical systen with periodic boundary-value conditions | Pei, T.-H.; Tsai, K.-Y.; JIA-HAN LI ; KUEN-YU TSAI | Advanced Materials Research | 0 | 0 | |
2011 | Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects | Ng, Philip C.W.; Tsai, Kuen-Yu ; Lee, Yen-Min; Wang, Fu-Min; Li, Jia-Han ; JIA-HAN LI | Journal of Micro/Nanolithography MEMS and MOEMS | 2 | 0 | |
2011 | Erratum: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects (Journal of Micro/ Nanolithography, MEMS, and MOEMS (2011) 10 (013004)) | Ng P.C.W; KUEN-YU TSAI ; Lee Y.-M; Wang F.-M; JIA-HAN LI ; Chen A.C. | Journal of Micro/Nanolithography, MEMS, and MOEMS | 2 | 0 | |
2023 | eVTOL, UAM, and AAM: Brief Development History and Implementation Outlook of the United States | KUEN-YU TSAI ; Meng, Guang Yun; Wu, Tung Ling; Zheng, Ming Hui; Wang, Wei Yao; Kung, Chih Ming; Chen, Yen Chuan; Huang, Chi Fa; Hsieh, Tsang Chieh; Hsu, Hsin Sheng; Lin, Huei Der; Shi, Jing Xiang | Proceedings - 2023 IEEE International Conference on e-Business Engineering, ICEBE 2023 | | | |
2011 | Fabrication method of high-quality Ge nanocrystals on patterned Si substrates by local melting point control | Chien-Wei Chiu; Ting-Wei Liao; Kuen-Yu Tsai; Fu-Min Wang; Yuen-Wuu Suen; Chieh-Hsiung Kuan; KUEN-YU TSAI ; CHIEH-HSIUNG KUAN | Nanotechnology | 2 | 3 | |
2016 | Fabrication of metrology test structures with programmed imperfection using helium ion beam direct write | Sheng-Wei Chien; Kuen-Yu Tsai*; Jia-Han Li; KUEN-YU TSAI | 2016 ZEISS Korea Microscopy Workshop | | | |
2010 | Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write | Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2010 | 6 | 0 | |
2017 | Fabrication of programmed defects for non-imaging EUV mask inspection by helium ion beam direct milling | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | The 30th International Microprocesses and Nanotechnology Conference (MNC 2017) | | | |
2006 | Feedback control of piezo-based nanopositioning systems for semiconductor manufacturing | Chun-Hung Liu; Yea-Chin Yeh; Kuen-Yu Tsai; Jia-Yush Yen; Arthur Tay; Jyh-Fa Lee; KUEN-YU TSAI | IFAC Workshop on Advanced Process Control for Semiconductor Manufacturing | | | |
2018 | Focused helium ion beam applications in advanced-node nanolithography R/D | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | 1st Annual Zeiss Process Control Innovations Seminar (PCIS) | | | |
2010 | Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors | Tsai, K.-Y.; Chen, S.-Y.; Pei, T.-H.; KUEN-YU TSAI ; JIA-HAN LI | Japanese Journal of Applied Physics | 2 | 2 | |
2011 | Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects | Ng, P.C.W.; Tsai, K.-Y.; Lee, Y.-M.; Wang, F.-M.; Li, J.-H.; KUEN-YU TSAI ; JIA-HAN LI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 27 | 24 | |